The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Apr. 19, 2006
Taizou Hamada, Osaka, JP;
Tatsutoshi Suenaga, Osaka, JP;
Taizou Hamada, Osaka, JP;
Tatsutoshi Suenaga, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
Provided is a foreign matter inspection method for positively detecting a foreign matter in the neighborhood of the edge of a mirror-finished substrate without fail. Edge-emphasis and binarization are performed following the taking of an image of a substrate-under-inspection at a contour of its inspection area, to further detect a plurality of sampling points representative of a contour of the inspection area. An estimated inspection area is determined by determining the size, position and rotation angle of contour lines defined, size-reducibly, from the coordinates of the plurality of sampling points. After applying a mask to the binary image data in an area other than the estimated inspection area, a foreign-matter detection step is performed.