The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Sep. 03, 2010
Hidefumi Yoshida, Kawasaki, JP;
Tsutomu Seino, Kawasaki, JP;
Yasutoshi Tasaka, Kawasaki, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
An alignment-treating method including a first irradiation step of conducting an alignment-treating for realizing an alignment of liquid crystals in a predetermined azimuth direction on a alignment layer of a substrate by obliquely irradiating the substrate with ultraviolet rays, and a second irradiation step of conducting an alignment-treating for realizing an alignment of liquid crystals in an azimuth direction different from the predetermined azimuth direction by obliquely irradiating a region of the substrate where ultraviolet ray irradiation has not been conducted in the first irradiation step with ultraviolet rays in an azimuth direction 180° different from an azimuth direction of ultraviolet ray irradiation in the first irradiation step. In the first and second irradiation steps, the substrate is obliquely irradiated with ultraviolet rays, through a mask having stripe-shaped light shielding area and stripe-shaped opening, in an azimuth direction parallel to a longer direction of the stripe-shaped opening.