The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2011

Filed:

Sep. 18, 2008
Applicants:

Hyun Cheol Koo, Seoul, KR;

Suk Hee Han, Seoul, KR;

Joon Yeon Chang, Seoul, KR;

Hyung Jun Kim, Seoul, KR;

Kyung Ho Kim, Seoul, KR;

Inventors:

Hyun Cheol Koo, Seoul, KR;

Suk Hee Han, Seoul, KR;

Joon Yeon Chang, Seoul, KR;

Hyung Jun Kim, Seoul, KR;

Kyung Ho Kim, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/82 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A spin transistor conducive to the miniaturization and large scale integration of devices, because a magnetization direction of a source and a drain is determined by a direction of the epitaxial growth of a ferromagnet. The spin transistor includes a semiconductor substrate having a channel layer formed thereinside; ferromagnetic source and drain epitaxially grown on the semiconductor substrate and magnetized in a longitudinal direction of the channel layer due to magnetocrystalline anisotropy—the source and drain being disposed spaced apart from each other in a channel direction and magnetized in the same direction—; and a gate disposed between the source and the drain to be insulated with the semiconductor substrate and formed on the semiconductor substrate to control the spin of electrons that are passed through the channel layer.


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