The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Feb. 24, 2009
Masayuki Hashitani, Chiba, JP;
Masayuki Hashitani, Chiba, JP;
Seiko Instruments Inc., , JP;
Abstract
A semiconductor device has a first conductivity type semiconductor substrate, a second conductivity type buried layer formed in a predetermined region on the semiconductor substrate, and a first conductivity type epitaxial growth layer formed on the buried layer and the semiconductor substrate. Trenches are formed in the epitaxial growth layer and arranged side by side in a gate width direction of a transistor to be formed. An entire bottom surface of each trench is entirely surrounded by and disposed in contact with the buried layer. A gate electrode is formed inside and on a top surface of each of the trenches and on a surface of the epitaxial growth layer adjacent to each of the trenches via a gate insulating film. A second conductivity type high concentration source diffusion layer is formed on one side of the gate electrode. A second conductivity type high concentration drain diffusion layer formed on another side of the gate electrode.