The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Sep. 25, 2007
Applicants:
Kenji Wada, Shizuoka, JP;
Hiroshi Saegusa, Shizuoka, JP;
Inventors:
Kenji Wada, Shizuoka, JP;
Hiroshi Saegusa, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08F 14/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10or less.
Wada, Kenji. (2011). Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition (U.S. Patent No. 8053161). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8053161
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