The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2011

Filed:

Feb. 27, 2008
Applicants:

Neal T. Sullivan, Lunenburg, MA (US);

David Beaulieu, Groton, MA (US);

Anton Tremsin, Lafayette, CA (US);

Philippe DE Rouffignac, Cambridge, MA (US);

Michael D. Potter, Churchville, NY (US);

Inventors:

Neal T. Sullivan, Lunenburg, MA (US);

David Beaulieu, Groton, MA (US);

Anton Tremsin, Lafayette, CA (US);

Philippe De Rouffignac, Cambridge, MA (US);

Michael D. Potter, Churchville, NY (US);

Assignee:

Arradiance, Inc., Sudbury, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B31D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating a microchannel plate includes defining a plurality of pores extending from a top surface of a substrate to a bottom surface of the substrate where the plurality of pores has a resistive material on an outer surface that forms a first emissive layer. A second emissive layer is formed over the first emissive layer. The second emissive layer is chosen to achieve at least one of an increase in secondary electron emission efficiency and a decrease in gain degradation as a function of time. A top electrode is formed on the top surface of the substrate and a bottom electrode is formed on the bottom surface of the substrate.


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