The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
May. 06, 2008
Applicants:
Chih-chung Yang, Taipei, TW;
Cheng-yen Chen, Taipei, TW;
Cheng-hung Lin, Taipei, TW;
Dong-ming Yeh, Taipei, TW;
Inventors:
Chih-Chung Yang, Taipei, TW;
Cheng-Yen Chen, Taipei, TW;
Cheng-Hung Lin, Taipei, TW;
Dong-Ming Yeh, Taipei, TW;
Assignee:
National Taiwan University, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a periodic structure is disclosed. A structural layer and an optical modulation element are provided. A light is emitted to pass through the optical modulation element to irradiate interference strips on the structural layer. A photoelectrochemical etching (PEC) is performed to form the periodic structure according the interference strips irradiated on the structural layer.