The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2011

Filed:

Sep. 27, 2010
Applicants:

Jinhee Yun, Gyeongbuk, KR;

Munik NA, Gwangju, KR;

Seunglyul Lee, Gyeongbuk, KR;

Kyoungshik Kim, Gyeongbuk, KR;

Junhyung Park, Seoul, KR;

Sanghyo Park, Busan, KR;

Jaehoon Choi, Seoul, KR;

Kagkyu Jung, Gyeonggi-do, KR;

Jaekwang Kim, Seoul, KR;

Inventors:

Jinhee Yun, Gyeongbuk, KR;

Munik Na, Gwangju, KR;

Seunglyul Lee, Gyeongbuk, KR;

Kyoungshik Kim, Gyeongbuk, KR;

Junhyung Park, Seoul, KR;

Sanghyo Park, Busan, KR;

Jaehoon Choi, Seoul, KR;

Kagkyu Jung, Gyeonggi-do, KR;

Jaekwang Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25B 9/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering apparatus includes a container; a plate for supporting the container; a first attachment for attaching the container to the plate; and a second attachment for less tightly attaching the container to the plate than through the first attachment.


Find Patent Forward Citations

Yun, Jinhee. (2011). Sputtering apparatus and method of preventing damage thereof (U.S. Patent No. 8052853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8052853

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…