The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2011

Filed:

Feb. 24, 2009
Applicants:

Zewu Chen, Schenectady, NY (US);

Rory Delaney, Burnt Hills, NY (US);

Kai Xin, Wynantskill, NY (US);

Inventors:

Zewu Chen, Schenectady, NY (US);

Rory Delaney, Burnt Hills, NY (US);

Kai Xin, Wynantskill, NY (US);

Assignee:

X-Ray Optical Systems, Inc., East Greenbush, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01);
U.S. Cl.
CPC ...
Abstract

An x-ray analysis system with an x-ray source for producing an x-ray excitation beam directed toward an x-ray analysis focal area; and a sample chamber for presenting a fluid sample to the x-ray analysis focal area. The x-ray excitation beam is generated by an x-ray engine and passes through an x-ray transparent barrier on a wall of the chamber, to define an analysis focal area within space defined by the chamber. The fluid sample is presented as a stream suspended in the space and streaming through the focal area, using a laminar air flow and/or pressure to define the stream. The chamber's barrier is therefore separated from both the focal area and the sample, resulting in lower corruption of the barrier.


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