The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
Apr. 13, 2009
Cancheepuram V. Srividya, Boise, ID (US);
Noel Rocklein, Boise, ID (US);
John Vernon, Boise, ID (US);
Jeff Nelson, Boise, ID (US);
F. Daniel Gealy, Boise, ID (US);
David Korn, Boise, ID (US);
Cancheepuram V. Srividya, Boise, ID (US);
Noel Rocklein, Boise, ID (US);
John Vernon, Boise, ID (US);
Jeff Nelson, Boise, ID (US);
F. Daniel Gealy, Boise, ID (US);
David Korn, Boise, ID (US);
Round Rock Research, LLC, Mt. Kisco, NY (US);
Abstract
The invention includes ALD-type methods in which two or more different precursors are utilized with one or more reactants to form a material. In particular aspects, the precursors are hafnium and aluminum, the only reactant is ozone, and the material is hafnium oxide predominantly in a tetragonal crystalline phase.