The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2011

Filed:

Nov. 10, 2006
Applicants:

Satoshi Maeshima, Hyogo, JP;

Yoshimasa Takii, Osaka, JP;

Masashi Morita, Osaka, JP;

Yoshiyasu Honma, Osaka, JP;

Mitsuo Saitoh, Osaka, JP;

Inventors:

Satoshi Maeshima, Hyogo, JP;

Yoshimasa Takii, Osaka, JP;

Masashi Morita, Osaka, JP;

Yoshiyasu Honma, Osaka, JP;

Mitsuo Saitoh, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

Evaporation chamber for depositing a protective film on a surface, where a dielectric layer is formed, of front substrate, front substrate is formed a display electrode and the dielectric layer thereon; transporting unit for transporting front substrate into evaporation chamber; gas introducing units for introducing gas containing HO into evaporation chamber; and partial pressure detecting unit for measuring a certain partial pressure of gas within evaporation chamber, extending from the center of deposition space of evaporation chamber to the downstream of transport direction of front substrate are provided. Gas containing HO is introduced from gas introducing units such that the partial pressure of gas is controlled in the partial pressure detecting unit.


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