The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
Dec. 30, 2005
Thomas Pompilio Diaz, San Martin, CA (US);
Samson Hettiarachchi, Menlo Park, CA (US);
Peter Louis Andresen, Niskayuna, NY (US);
Young Jin Kim, Niskayuna, NY (US);
Thomas Pompilio Diaz, San Martin, CA (US);
Samson Hettiarachchi, Menlo Park, CA (US);
Peter Louis Andresen, Niskayuna, NY (US);
Young Jin Kim, Niskayuna, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
Provided are methods and systems for generating nanoparticles from an inorganic precursor compound using a hydrothermal process within at least one CSTR or PFR maintained at an elevated temperature and an elevated pressure and a treatment vessel in which this reaction solution can be applied to one or more catalyst substrates. In operation, the reaction solution may be maintained within the CSTR at a substantially constant concentration and within a reaction temperature range for a reaction period sufficient to obtain nanoparticles having a desired average particle size of, for example, less than 10 nm formation and/or deposition. Variations of the basic method and system can provide, for example, the generation of complex particle size distribution profiles, the selective deposition of a multi-modal particle size distribution on a single substrate.