The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Apr. 15, 2009
Forrest Morgan, Masonville, CO (US);
Daryl Frost, Windsor, CO (US);
Frank Heine, Fort Collins, CO (US);
Doug Pelleymounter, Northfield, MN (US);
Hendrik Walde, Fort Collins, CO (US);
Forrest Morgan, Masonville, CO (US);
Daryl Frost, Windsor, CO (US);
Frank Heine, Fort Collins, CO (US);
Doug Pelleymounter, Northfield, MN (US);
Hendrik Walde, Fort Collins, CO (US);
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Abstract
One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.