The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Dec. 09, 2009
Jung Su Han, Daejeon, KR;
Byoung Yun Kim, Seoul, KR;
Ho Yeul Choi, Daejeon, KR;
Chang Sun Han, Daejeon, KR;
Seung Hun Yang, Daejeon, KR;
Jung Eun Kim, Daejeon, KR;
Jung Su Han, Daejeon, KR;
Byoung Yun Kim, Seoul, KR;
Ho Yeul Choi, Daejeon, KR;
Chang Sun Han, Daejeon, KR;
Seung Hun Yang, Daejeon, KR;
Jung Eun Kim, Daejeon, KR;
LG Chem, Ltd., , KR;
Abstract
A carboxylic acid-modified nitrile copolymer latex is provided. The copolymer latex comprises a carboxylic acid-modified nitrile copolymer of an unsaturated monomer having at least one crosslinkable functional group selected from vinyl and epoxy groups. The use of the copolymer latex enables the production of a molded article that does not undergo long stirring and maturation, causes no allergic reactions due to the absence of sulfur and a vulcanization accelerator, has good oil resistance and high mechanical strength, and produces a soft feeling. Further provided is a latex composition for dip forming comprising the copolymer latex, and an article produced from the latex composition by dip forming.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile