The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
May. 31, 2006
Applicants:
Daniel Biro, Freiburg, DE;
Catherine Voyer, Constance, DE;
Harald Wanka, Blaustein, DE;
Jörg Koriath, Blaubeuren, DE;
Inventors:
Daniel Biro, Freiburg, DE;
Catherine Voyer, Constance, DE;
Harald Wanka, Blaustein, DE;
Jörg Koriath, Blaubeuren, DE;
Assignees:
Centrotherm Photovoltaics AG, Blaubeuren, DE;
Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V., Munich, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/04 (2006.01); H01L 21/38 (2006.01); H01L 21/02 (2006.01); H01L 21/316 (2006.01); C09K 17/40 (2006.01); C09K 17/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A doping mixture for coating semiconductor substrates which are then subjected to a high temperature treatment to form a doped layer includes at least one p- or n-dopant, water and a mixture of two or more surfactants. At least one of the surfactants is nonionic. Also, provided are a method for producing such a doping mixture and the use thereof.