The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Sep. 14, 2007
Gang Zhang, Monterey Park, CA (US);
Gang Zhang, Monterey Park, CA (US);
Other;
Abstract
The embodiments of the present invention are directed to the formation of multi-layer silicon structures by forming and attaching a plurality of individual layers or structures where each of the layers or the structures comprises at least silicon forming a desired pattern. In some embodiments or some applications of some embodiments, at least one of the plurality of individual layers or the structures comprises a plurality of discrete silicon features that are combined together with at least one sacrificial material. In some embodiments or some applications of some embodiments, at least one of the plurality of individual layers or the structures comprises a plurality of discrete silicon features that are supported by a temporary substrate. Still in some embodiments or some applications of some embodiments, at least one of the plurality of individual layers or the structures needs to be machined after it is attached to a receiver such as a substrate or an another layer or structure. The present invention also discloses various fabrication methods for making required silicon layers or structures and attaching methods for forming multi-layer silicon structures.