The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Nov. 01, 2006
Filip Frederix, Leuven, BE;
Kristien Bonroy, Averbode, BE;
Filip Frederix, Leuven, BE;
Kristien Bonroy, Averbode, BE;
IMEC, Leuven, BE;
Abstract
A method for determining a concentration of an analyte is provided. The method includes providing a substrate including a conductive region and a recognition layer where the conductive region has a first surface operatively coupled with the recognition layer; The method also includes contacting the substrate with the sample to bind at least some of the analyte that may present in the sample with the recognition layer; The method further includes directing radiation through the conductive region and the recognition layer, where the conductive region comprises at least one particle and a combination of the at least one particle effect when the radiation is directed through the conductive region and the recognition layer; The method still further includes measuring at least a part of a spectrum of the radiation that is absorbed or transmitted by or through the substrate, the at least part of the spectrum being related to one or more of the at least one particle effects; The method further includes determining a change of the at least part of the spectrum as compared with a reference spectrum and determining the concentration of the analyte from the change.