The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Oct. 20, 2005
Applicants:
Hongyu Chen, Lake Jackson, TX (US);
Ronald Wevers, Terneuzen, NL;
David G. Mcleod, Rochester, MI (US);
Inventors:
Hongyu Chen, Lake Jackson, TX (US);
Ronald Wevers, Terneuzen, NL;
David G. McLeod, Rochester, MI (US);
Assignee:
Dow Global Technologies LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Improved microlayer structures and methods typically employing at least 4 stacked layers of polymers (e.g., including alternating layers of components A and B), such as that obtained by coextrusion. The layers each have a thickness of less than about 50 microns. One optional approach involves forming an intermediate form that includes at least one elongated member made from the plurality of layers, from which a shaped composite article may be made.