The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2011

Filed:

Apr. 01, 2009
Applicants:

Hui-ta Chen, Taichung, TW;

Chun-hao Chang, Kaohsiung County, TW;

Sung-ho Liu, Kaohsiung, TW;

Chun-hao Tseng, Pingtung County, TW;

Inventors:

Hui-Ta Chen, Taichung, TW;

Chun-Hao Chang, Kaohsiung County, TW;

Sung-Ho Liu, Kaohsiung, TW;

Chun-Hao Tseng, Pingtung County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 65/16 (2006.01); B29C 65/48 (2006.01); B32B 37/14 (2006.01); B32B 38/10 (2006.01); H01L 21/027 (2006.01); B29C 65/54 (2006.01); B32B 37/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming gas barriers on electronic devices is provided. The fabrication method includes: providing a first substrate having at least one electronic device thereon; providing a second substrate and forming a gas barrier over the second substrate; disposing the second substrate over the first substrate, wherein the gas barrier faces the electronic device; providing an electromagnetic wave light source over the second substrate; and irradiating the second substrate by the electromagnetic wave light source to transfer the gas barrier to the electronic device and cover the electronic device.


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