The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Jun. 13, 2007
Applicant:

Masayuki Mizusawa, Tokyo, JP;

Inventor:

Masayuki Mizusawa, Tokyo, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to an epi-illumination optical system for microscopes which relies upon a Köhler illumination system using a collective lens array, having simplified adjustment function capable of adjusting the image position of a light source to the back focal position of each microscope objective lens in operable association with microscope objective lens replacement. The invention provides an epi-illumination optical system for microscopes, with an objective lens serving as a condenser lens, which comprises a light source, a collimate lens, and a lens array. The epi-illumination optical system further comprises a projection optical system adapted to project an image of light source formed by collective lens array. The projection optical system comprises a partial optical system movable in an optical axis direction, so that the imaging position for the image array of light source is adjustable to the back focal position of the objective lens.


Find Patent Forward Citations

Loading…