The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
May. 15, 2006
Chong-chul Chai, Seoul, KR;
Shi-yul Kim, Yongin-si, KR;
Sang-gab Kim, Seoul, KR;
Jun-hyung Souk, Yongin-si, KR;
Sang-woo Whangbo, Seoul, KR;
Won-kie Chang, Seoul, KR;
Hi-kuk Lee, Yongin-si, KR;
Soo-wan Yoon, Seoul, KR;
Soo-jin Kim, Suwon-si, KR;
Chong-Chul Chai, Seoul, KR;
Shi-Yul Kim, Yongin-si, KR;
Sang-Gab Kim, Seoul, KR;
Jun-Hyung Souk, Yongin-si, KR;
Sang-Woo Whangbo, Seoul, KR;
Won-Kie Chang, Seoul, KR;
Hi-Kuk Lee, Yongin-si, KR;
Soo-Wan Yoon, Seoul, KR;
Soo-Jin Kim, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.