The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Oct. 14, 2010
Applicants:

Kenta Saitou, Tokyo, JP;

Akio Koike, Tokyo, JP;

Mitsuhiro Kawata, Tokyo, JP;

Inventors:

Kenta Saitou, Tokyo, JP;

Akio Koike, Tokyo, JP;

Mitsuhiro Kawata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03C 3/076 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a TiO-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO-containing silica glass for optical member for EUV lithography, having a TiOconcentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T, of 70% or more.


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