The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Oct. 05, 2006
Applicants:

Teruyuki Sasaki, Tokyo, JP;

Kazutaka Kamitani, Tokyo, JP;

Kazuyuki Inoguchi, Tokyo, JP;

Inventors:

Teruyuki Sasaki, Tokyo, JP;

Kazutaka Kamitani, Tokyo, JP;

Kazuyuki Inoguchi, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/04 (2006.01); B32B 17/06 (2006.01); B32B 9/00 (2006.01); B32B 13/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An article with a silica-based film that contains an organic material and has excellent mechanical strength. This article includes a substrate and an organic-inorganic composite film that is formed on the surface of the substrate. The organic-inorganic composite film contains silica as its main component. A value of (0.19A+0.03) or lower (A denotes the film thickness [μm]) is obtained through X-ray diffraction analysis on the organic-inorganic composite film, with the X-ray incident angle being fixed at 1° with respect to the surface of the organic-inorganic composite film, when the intensity of a peak at a diffraction angle of 3° to 10° is standardized using the intensity of a halo pattern peak at a diffraction angle of 20° to 30°. A value of 0.25 or lower is obtained through Fourier transform infrared spectroscopy analysis on the organic-inorganic composite film, when the intensity of a peak at around 950 cmbased on a Si—OH group is standardized using the intensity of a peak at around 1100 cmbased on a Si—O—Si bond.


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