The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Jan. 25, 2008
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Feng Chen, Kyoto, JP;
Hiroshi Yoshida, Ibaraki, JP;
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Feng Chen, Kyoto, JP;
Hiroshi Yoshida, Ibaraki, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A, as a component of the continuous phase, composed of polymerized monomers a, and a block chain B, as a component of the cylindrical phases, composed of polymerized monomers b; and a second block copolymer including at least a block chain A, as a component of the continuous phase, composed of polymerized monomers a, and a block chain B, as a component of the cylindrical phases, composed of polymerized monomers b, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.