The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Sep. 05, 2007
Tatsuo Nagai, Tokyo, JP;
Hiroshi Morita, Tokyo, JP;
Hiroaki Takahashi, Kyoto, JP;
Hiroaki Uchida, Kyoto, JP;
Toyohide Hayashi, Kyoto, JP;
Tatsuo Nagai, Tokyo, JP;
Hiroshi Morita, Tokyo, JP;
Hiroaki Takahashi, Kyoto, JP;
Hiroaki Uchida, Kyoto, JP;
Toyohide Hayashi, Kyoto, JP;
Kurita Water Industries Ltd., , JP;
Abstract
A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can be recycled, are provided. The substrate processing apparatus includes: a substrate holding means holding a substrate; a peroxosulfuric acid generating means generating a peroxosulfuric acid using sulfuric acid; a mixing means mixing the peroxosulfuric acid generated by the peroxosulfuric acid generating means and sulfuric acid of higher temperature and higher concentration than the sulfuric acid used in the peroxosulfuric acid generating means; and a discharging means discharging, toward the substrate held by the substrate holding means, the mixed solution of the peroxosulfuric acid and the sulfuric acid mixed by the mixing means as a processing solution for removing a resist from the substrate.