The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
May. 21, 2008
Applicants:
Hayato Iwamoto, Kanagawa, JP;
Noriaki Adachi, Kyoto, JP;
Inventors:
Hayato Iwamoto, Kanagawa, JP;
Noriaki Adachi, Kyoto, JP;
Assignees:
Sony Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process step. Thus, by setting each threshold value depending on the type of liquid chemical to be used immediately before the rinsing process, the substrate cleaning apparatus can use an optimum threshold value during the rinsing process in each process step to make a check of the resistivity. This allows the proper completion of the rinsing process in each process step.