The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Oct. 11, 2006
Applicant:
Richard Haven, Sunnyvale, CA (US);
Inventor:
Richard Haven, Sunnyvale, CA (US);
Assignee:
Avago Technologies General IP (Singapore) Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system for identifying artifacts in an image. The system includes an input for receiving images from an imager, the images comprising a pixel of interest. The images can be generated by reflecting light off an object. The system further includes a processor coupled to the input for defining and using at least one contrast value of a second pixel associated with the pixel of interest to identify artifacts in the image.
Haven, Richard. (2011). Contrast-based technique to reduce artifacts in wavelength-encoded images (U.S. Patent No. 8036423). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8036423
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile