The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Feb. 23, 2009
Yoichi Hirayama, Hitachinaka, JP;
Takaho Yoshida, Higashimatsuyama, JP;
Yoichi Hirayama, Hitachinaka, JP;
Takaho Yoshida, Higashimatsuyama, JP;
Hitachi, Ltd., Tokyo, JP;
Okinawa Institute of Science and Technology Promotion Corporation, Okinawa, JP;
Abstract
To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multipole lenses, three rotationally symmetric lenses are disposed between an objective lens and a multipole lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multipole lens. When using the objective lens with a short focal length, e.g. for high resolution observation, aberrations are corrected using two rotationally symmetric lenses of a different combination to those used for a long focus, among the three rotationally symmetric lenses disposed between the objective lens and the multipole lens. (See FIG.)