The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Jun. 24, 2008
Hideaki Tsubaki, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Kenji Wada, Shizuoka, JP;
Wataru Hoshino, Minami-Ashigara, JP;
Hideaki Tsubaki, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Kenji Wada, Shizuoka, JP;
Wataru Hoshino, Minami-Ashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein Rrepresents a hydrogen atom or an alkyl group; and Rto Reach independently represents a hydrogen atom or a hydroxyl group, provided that at least one of Rto Rrepresents a hydroxyl group.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile