The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Dec. 20, 2007
Takanori Yamagishi, Ichihara, JP;
Ichiro Kato, Ichihara, JP;
Satoshi Yamaguchi, Chuo-ku, JP;
Kouzo Osaki, Funabashi, JP;
Yasuo Shibata, Ichihara, JP;
Isao Magara, Ichihara, JP;
Hideki Omori, Chuo-ku, JP;
Kensuke Iuchi, Ichihara, JP;
Takanori Yamagishi, Ichihara, JP;
Ichiro Kato, Ichihara, JP;
Satoshi Yamaguchi, Chuo-ku, JP;
Kouzo Osaki, Funabashi, JP;
Yasuo Shibata, Ichihara, JP;
Isao Magara, Ichihara, JP;
Hideki Omori, Chuo-ku, JP;
Kensuke Iuchi, Ichihara, JP;
Maruzen Petrochemical Co., Ltd., Tokyo, JP;
Abstract
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.