The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2011

Filed:

Dec. 22, 2006
Applicants:

Alexey G. Ryazanov, Princeton, NJ (US);

Hsueh-ping Chu, Taipei, TW;

Inventors:

Alexey G. Ryazanov, Princeton, NJ (US);

Hsueh-Ping Chu, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 48/00 (2006.01); A61K 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods are provided to increase resistance to cell damage in a subject. The increase in resistance to cell damage in a subject in the subject is accomplished by decreasing activity of eEF2 kinase in the subject. The eEF2 kinase activity can be decreased by decreasing the amount of functional eEF2 kinase produced by the subject, including contacting the eEF2 kinase with a compound that inhibits phosphorylation of eEF2 kinase substrate or decreasing the amount of functional eEF2 kinase is decreased by reducing expression of a gene encoding the eEF2 kinase.


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