The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Jan. 12, 2007
Jai-moo Yoo, Kyungsangnam-do, KR;
Young-kuk Kim, Kyungsangnam-do, KR;
Jae-woong Ko, Kyungsangnam-do, KR;
Kook-chae Chung, Kyungsangnam-do, KR;
Jai-Moo Yoo, Kyungsangnam-do, KR;
Young-Kuk Kim, Kyungsangnam-do, KR;
Jae-Woong Ko, Kyungsangnam-do, KR;
Kook-Chae Chung, Kyungsangnam-do, KR;
Korea Institute of Machinery & Materials, Daejeon, KR;
Abstract
Disclosed herein is a precursor solution for forming a biaxially oriented buffer layer through low-temperature heat treatment, by which a highly oriented buffer layer can be formed even when the precursor solution is heat-treated at a low temperature of 1000° C. or lower at the time of forming a buffer layer through a wet chemical method. The precursor solution is prepared by adding a carboxylate or an alkoxide of bismuth, boron, lead, gallium, or the like, which is a metal salt for forming an oxide having a low melting point of 1200° C. or lower after pyrolysis in an oxygen atmosphere, to a precursor solution for forming a buffer layer through a wet chemical method.