The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
May. 26, 2009
Koji Kadono, Tokyo, JP;
Yosuke Murakami, Tokyo, JP;
Koji Kadono, Tokyo, JP;
Yosuke Murakami, Tokyo, JP;
Sony Corporation, Tokyo, JP;
Abstract
Disclosed herein are a method of producing microstructure and a method of producing mold, the methods permitting production of much smaller pores than before in an atmosphere where impurities are negligible and also permitting production of microstructures having a smaller size and a higher crystallinity than before with the help of the pores. The method of producing microstructure comprises a step of making pores () in a substrate () to become a mold () by irradiation with a focused energy beam () and a step of growing a microstructure () in the thus made pores (). The method of producing a mold includes a step of making pores () by irradiating a substrate () to become a mold () with a focused energy beam ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile