Method of forming a display device by using separate masks in forming source and drain regions of mos transistors

Abstract

A method of forming a display device is provided. The method includes the following steps: providing a substrate which includes a driving circuit region and a pixel region; forming a first island and a second island in the driving circuit region on the substrate with a semiconductor material; performing a first ion implantation process to dope ions into both of the first island and the second island; forming a first patterned mask on the substrate to cover the second island and expose a part of the first island; performing a second ion implantation process by using the first patterned mask as a mask to form a first source/drain region in the first island; removing the first patterned mask; forming a first gate and a second gate on the first island and the second island respectively; forming a second patterned mask on the substrate to cover the first island and expose a part of the second island; and performing a third ion implantation process by using both of the second patterned mask and the second gate as a mask to form a second source/drain region in the second island. The first island, the first source/drain region, and the first gate form a NMOS device, and the second island, the second source/drain region, and the second gate form a PMOS device.