The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2011

Filed:

Oct. 31, 2005
Applicants:

Dan Wu, Cincinnati, OH (US);

Charles Scott, Thornhill, CA;

Carlos CO, Cincinnati, OH (US);

Chia-chi Ho, Cincinnati, OH (US);

Inventors:

Dan Wu, Cincinnati, OH (US);

Charles Scott, Thornhill, CA;

Carlos Co, Cincinnati, OH (US);

Chia-Chi Ho, Cincinnati, OH (US);

Assignee:

The University of Cincinnati, Cincinnati, OH (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 13/02 (2006.01); B32B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for the encapsulation of liquid particles within nanometer thick polymer shells utilizes an interfacial free radical alternating copolymerization process. Encapsulating a liquid material includes providing a mixture comprising the liquid material to be encapsulated, a hydrophobic monomer in a non-polar solution and a hydrophilic monomer in a polar solution. The liquid material is compatible in either the polar solution or the non-polar solution. The polar solution and the non-polar solution are not miscible in each other. The mixture is homogenized to form an emulsion, and then polymerized by an initiator which initiates an interfacial free radical alternating copolymerization process. The copolymerization process is optimally constrained to proceed only at the hydrophobic and hydrophilic interface thus forming a polymer around the liquid material.


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