The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Mar. 05, 2008
Akihiko Takenouchi, Noda, JP;
Hiromitsu Numauchi, Tsukuba, JP;
Akehiro Kusaka, Noda, JP;
Komori Corporation, Tokyo, JP;
Abstract
Disclosed is a contact-pressure adjusting method and a contact-pressure adjusting system, each of which automatically adjusts the contact pressure between two rotors, for a liquid application machine including: a first rotor to which liquid is supplied; a second rotor to which the liquid is supplied from the first rotor; and a contact-pressure adjusting unit for adjusting the contact pressure between the first rotor and the second rotor. By using a temperature measuring unit, measured is: the temperature of at least one of the surfaces of the first and second rotors; the temperature of at least one of the liquid on the surface of the first rotor and the liquid on the surface of the second rotor; or the temperature of at least one of the vicinity of the first rotor and the vicinity of the second rotor. The contact-pressure adjusting unit is adjusted in accordance with the measured temperature.