The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Apr. 22, 2010
Hyun-min Cho, Seoul, KR;
Sung-jin Kim, Seongnam-si, KR;
Yu-kwan Kim, Incheon-si, KR;
Don-chan Cho, Seongnam-si, KR;
Seul Lee, Seoul, KR;
Jae-byung Park, Seoul, KR;
Su-gyeong Lee, Seongnam-si, KR;
Seon-tae Yoon, Seoul, KR;
Hyun-Min Cho, Seoul, KR;
Sung-Jin Kim, Seongnam-si, KR;
Yu-Kwan Kim, Incheon-si, KR;
Don-Chan Cho, Seongnam-si, KR;
Seul Lee, Seoul, KR;
Jae-Byung Park, Seoul, KR;
Su-Gyeong Lee, Seongnam-si, KR;
Seon-Tae Yoon, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
The present invention relates to a display device using a microelectromechanical system (MEMS) and to a manufacturing method thereof. A display device using a MEMS includes a first substrate comprising a first index of refraction; a second substrate facing the first substrate; a reflective layer formed on the first substrate and having a first aperture; a transparent layer covering the first aperture and comprising a second refractive index; and a shutter arranged on the second substrate, wherein a difference between the first refractive index and the second refractive index is equal to or less than 0.1.