The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8027025 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 27, 2011

Filed:

Jun. 25, 2008
Applicant:

Yoshiyuki Sekine, Utsunomiya, JP;

Inventor:

Yoshiyuki Sekine, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus which exposes a substrate with exposure light, includes a projection optical system which projects a pattern image of an original onto the substrate; a first illumination unit which illuminates the original with the exposure light; and a second illumination unit which guides illumination light that is different from the exposure light for exposing the substrate to the projection optical system, the second illumination unit includes a modifier which modifies an illumination distribution of the illumination light entering an optical element near a pupil of the projection optical system and an optical element which is the closest to the original in the projection optical system.


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Sekine, Yoshiyuki. (2011). Exposure apparatus and device manufacturing method (U.S. Patent No. 8027025). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8027025

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