The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Dec. 23, 2004
Applicants:
Andrew C. Perry, Oradell, NJ (US);
Paul S. Gilman, Suffern, NY (US);
Inventors:
Andrew C. Perry, Oradell, NJ (US);
Paul S. Gilman, Suffern, NY (US);
Assignee:
Praxair S. T. Technology, Inc., North Haven, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D 6/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
The sputter target has a composition selected from the group consisting of high-purity copper and copper-base alloys. The sputter target's grain structure is at least about 99 percent recrystallized; and the sputter target's face has a grain orientation ratio of at least about 10 percent each of (111), (200), (220) and (311). In addition, the sputter target has a grain size of less than about 10 μm for improving sputter uniformity and reducing sputter target arcing.