The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
May. 07, 2008
Applicants:
Zhen Wang, Lake Zurich, IL (US);
Robert Abraham, Bolingbrook, IL (US);
Inventors:
Zhen Wang, Lake Zurich, IL (US);
Robert Abraham, Bolingbrook, IL (US);
Assignee:
Amcol International Corporation, Hoffman Estates, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 39/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The use of a sulfur-impregnated organoclay provides a mercury or arsenic removal media having increased reactivity, stability, and mercury removal ability. The Hg/As removal media described herein is prepared by impregnating an organophilic clay with elemental (free state) sulfur. Alternatively, the clay can be made organophilic by onium ion reaction prior to or simultaneously with impregnating the organoclay with sulfur.