The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Dec. 12, 2008
Colin Michael Sayers, Katy, TX (US);
Colin Michael Sayers, Katy, TX (US);
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
The invention relates to a method for determining maximum horizontal stress in an earth formation. The method includes obtaining fast shear wave velocities (V) and slow shear wave velocities (V) for various depths in the earth formation, calculating shear wave anisotropy (A) using Vand V, obtaining vertical stress (S) and minimum horizontal stress (S) for the formation, representing maximum horizontal stress (S) using a parameterized function having at least one parameter and usingand Sas input, determining a value of the at least one parameter by minimizing a cost function that represents a measure of difference between Aand Afor the various depths and Ais predicted shear wave anisotropy determined using S, S, and S, calculating Susing the parameterized function and the value of the at least one parameter, and storing Sin relation to the earth formation.