The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
May. 19, 2005
Jung Ik Ha, Seoul, KR;
Jung Ik Ha, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
A method of and apparatus to generate a position profile using lower-order polynomials. The device includes a pattern coefficient generator to generate pattern and time coefficients of a position pattern that is classified by velocity change, a contour generator to generate a pattern polynomial to define a contour of each section of the position pattern using the generated pattern and time coefficients, and a dual filter for generating a position profile by selectively activating one of a plurality of filters, which receive the pattern polynomial generated by the contour generator. The device uses lower-order polynomials and a small number of coefficients, thereby reducing the number of calculations required in the procedure to generate the position profile. The device generates a seamless and smooth position profile by preventing switching errors due to the difference between filter sizes.