The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
May. 07, 2008
Mark W. Miles, Atlanta, GA (US);
Brian W. Arbuckle, Danville, CA (US);
Ion Bita, San Jose, CA (US);
Manish Kothari, Cupertino, CA (US);
Patrick F. Brinkley, San Mateo, CA (US);
Gang Xu, Cupertino, CA (US);
Nassim Khonsari, Redwood City, CA (US);
Jonathan C. Griffiths, Fremont, CA (US);
Mark W. Miles, Atlanta, GA (US);
Brian W. Arbuckle, Danville, CA (US);
Ion Bita, San Jose, CA (US);
Manish Kothari, Cupertino, CA (US);
Patrick F. Brinkley, San Mateo, CA (US);
Gang Xu, Cupertino, CA (US);
Nassim Khonsari, Redwood City, CA (US);
Jonathan C. Griffiths, Fremont, CA (US);
QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);
Abstract
Methods of fabricating a static interferometric image device and static interferometric image device formed by the same are disclosed. In one embodiment, a method includes providing a substrate. A plurality of liquid layers are formed over the substrate by an inkjet process such that the layers are lateral to one another. The liquid layers contain a solidifiable material or particles. Then, the plurality of liquid layers are solidified to form a plurality of solid layers. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the liquid layers are formed on the surface. The inkjet process provides optical fillers or spacers for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.