The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2011

Filed:

Aug. 20, 2008
Applicants:

Tae Youb Kim, Seoul, KR;

Nae Man Park, Daejeon, KR;

Han Young Yu, Daejeon, KR;

Moon Gyu Jang, Daejeon, KR;

Jong Heon Yang, Daejeon, KR;

Inventors:

Tae Youb Kim, Seoul, KR;

Nae Man Park, Daejeon, KR;

Han Young Yu, Daejeon, KR;

Moon Gyu Jang, Daejeon, KR;

Jong Heon Yang, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/085 (2006.01); H01L 27/14 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a biosensor with a silicon nanowire and a method of manufacturing the same, and more particularly, a biosensor with a silicon nanowire including a defect region formed by irradiation of an electron beam, and a method of manufacturing the same. The biosensor includes: a silicon substrate; a source region disposed on the silicon substrate; a drain region disposed on the silicon substrate; and a silicon nanowire disposed on the source region and the drain region, and having a defect region formed by irradiation of an electron beam. Therefore, by irradiating a certain region of a high-concentration doped silicon nanowire with an electron beam to lower electron mobility in the certain region, it is possible to maintain a low contact resistance between the silicon nanowire and a metal electrode and to lower operation current of a biomaterial detection part, thereby improving sensitivity of the biosensor.


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