The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2011

Filed:

Oct. 28, 2008
Applicants:

Daojing Wang, Daly City, CA (US);

Peidong Yang, Kensington, CA (US);

Woong Kim, Seoul, KR;

Rong Fan, Pasadena, CA (US);

Inventors:

Daojing Wang, Daly City, CA (US);

Peidong Yang, Kensington, CA (US);

Woong Kim, Seoul, KR;

Rong Fan, Pasadena, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/04 (2006.01); B05B 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

Novel and significantly simplified procedures for fabrication of fully integrated nanoelectrospray emitters have been described. For nanofabricated monolithic multinozzle emitters (NMemitters), a bottom up approach using silicon nanowires on a silicon sliver is used. For microfabricated monolithic multinozzle emitters (Memitters), a top down approach using MEMS techniques on silicon wafers is used. The emitters have performance comparable to that of commercially-available silica capillary emitters for nanoelectrospray mass spectrometry.


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