The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2011

Filed:

Aug. 25, 2010
Applicants:

Kenneth Edward Hrdina, Horseheads, NY (US);

Michael a Mueller, Roth, DE;

Barbara L Stainbrook, Lawrenceville, PA (US);

Inventors:

Kenneth Edward Hrdina, Horseheads, NY (US);

Michael A Mueller, Roth, DE;

Barbara L Stainbrook, Lawrenceville, PA (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 17/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A low thermal expansion glass includes a base glass material having a front surface, a back surface, and a thickness and a glass coating material applied on at least the front surface of the base glass material. The base glass material consists essentially 10 wt % to 20 wt % titania and 80 wt % to 90 wt % silica. The glass coating material also consists essentially of titania and silica, but the total amount of titania in the glass coating material is lower than the total amount of titania in the base glass material. A silica-titania glass element suitable for extreme ultraviolet lithography applications consists of 12 wt % to 20 wt % titania and 80 wt % to 88 wt % silica and has a coefficient of thermal expansion of essentially 0 ΔL/L in a temperature range of −20° C. to +100° C.


Find Patent Forward Citations

Loading…