The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Nov. 22, 2005
Pascal Colpo, Annecy, FR;
François Rossi, Cittiglio, IT;
Reinhard Fendler, Moritzburg/OT Boxdorf, DE;
Pascal Colpo, Annecy, FR;
François Rossi, Cittiglio, IT;
Reinhard Fendler, Moritzburg/OT Boxdorf, DE;
Abstract
An inductively coupled plasma processing apparatus () comprises a plasma chamber () with a dielectric window () forming a self-supporting wall element of the plasma chamber (). The dielectric window () has an external and an internal side with respect to the chamber (). An electromagnetic field source () is arranged in front of the external side of the dielectric window () for generating an electromagnetic field within the plasma chamber (). The field source comprises at least one magnetic core (). The at least one magnetic core () is attached to the external side of the dielectric window (), such that the at least one magnetic core helps the dielectric window () to withstand collapsing forces caused by negative pressure inside said chamber during operation.