The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Mar. 31, 2009
Thomas C. Heldwein, Pendleton, NY (US);
Joseph Agnello, Grand Island, NY (US);
Aaron J. Muck, Clarence, NY (US);
Zhanping Xu, East Amherst, NY (US);
Brian J. Nowak, Orchard Park, NY (US);
Thomas C. Heldwein, Pendleton, NY (US);
Joseph Agnello, Grand Island, NY (US);
Aaron J. Muck, Clarence, NY (US);
Zhanping Xu, East Amherst, NY (US);
Brian J. Nowak, Orchard Park, NY (US);
UOP LLC, Des Plaines, IL (US);
Abstract
Improved contacting stages for carrying out vapor-liquid contacting are described. Particular aspects are directed to co-current vapor-liquid contacting devices with non-parallel contacting stages that provide an efficient usage of column space for fluid flow and contacting, in order to achieve high capacity, high efficiency, and low pressure drop. The fabrication of such contacting stages is improved using one or more structural enhancements, preferably a combination of enhancements, to achieve easy installation and significantly improved rigidity between the various parts and thereby avoid movement/separation of these parts. This reduces the possibility of fluid leakage across, and consequently vapor and/or liquid bypassing of, the contacting stage.