The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Jul. 10, 2007
Steve S. Hongkham, San Ramon, CA (US);
Eric A. Englhardt, Palo Alto, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Helen R. Armer, Cupertino, CA (US);
Chongyang Chris Wang, San Jose, CA (US);
Steve S. Hongkham, San Ramon, CA (US);
Eric A. Englhardt, Palo Alto, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Helen R. Armer, Cupertino, CA (US);
Chongyang Chris Wang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput and repeatable wafer processing history are provided. In one embodiment a first substrate is transferred from a first position to a second position and then the first substrate is transferred from the second position to a third position using a first robot. A second substrate is transferred from a first position to a second position and then the second substrate is transferred from the second position to a third position using a second robot. The movement of the first and second robots is synchronized so that the movement from the first position to the second position by the first and second robot is performed within a first time interval.