The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Dec. 19, 2006
Jae-cheol Bae, Suwon-si, KR;
Joo-ho Kim, Yongin-si, KR;
In-oh Hwang, Seongnam-si, KR;
Hyun-soo Park, Seoul, KR;
Narutoshi Fukuzawa, Tokyo, JP;
Takashi Kikukawa, Tokyo, JP;
Tatsuhiro Kobayashi, Tokyo, JP;
Jae-cheol Bae, Suwon-si, KR;
Joo-ho Kim, Yongin-si, KR;
In-oh Hwang, Seongnam-si, KR;
Hyun-soo Park, Seoul, KR;
Narutoshi Fukuzawa, Tokyo, JP;
Takashi Kikukawa, Tokyo, JP;
Tatsuhiro Kobayashi, Tokyo, JP;
Samsung Electronics Co., Ltd., Suwon-si, KR;
TDK Corporation, Tokyo, JP;
Abstract
A method of determining an optimum reproduction condition of a first mark recorded on an optical recording medium that is smaller than a resolution of a pickup to reproduce the first mark. The method includes obtaining an optimum reproduction condition of a second mark having a length which closely approximates the resolution of the pickup, and determining the optimum reproduction condition of the first mark using the obtained optimum reproduction condition of the second mark.